Live Session Speakers

Virtual Meeting Overview & Highlights

ALD & ALE Tutorial Speakers

Sunday, June 27, 2021

• Parag Banerjee (University of Central Florida, USA), “TBD”
• Arrelaine Dameron (Forge Nano, USA), “TBD”
• Henrik Pedersen (Linkoping University, Sweden), “Let’s Talk Dirty – Battling Impurities in ALD Films”
• Riikka Puurunen (Aalto University, Finland), “Fundamentals of Atomic Layer Deposition: An Introduction (“ALD 101”)”
• Fred Roozeboom (Eindhoven University of Technology, The Netherlands), “Atomic Layer Etching and Deposition: Two of a Kind in Atomic-Scale Processing”

ALD & ALE Plenary Session Speakers

Monday, June 28, 2021

ALD Invited Speakers

• Julien Bachmann (FAU Erlangen-Nürnberg, Germany), “ALD in Photovoltaics: From Extremely Thin to Ultrathin Layers, Physical Insight, and Chemical Methods Development”
• Chunmei Ban (University of Colorado, Boulder, USA), “TBD”
• David Bergsman (University of Washington, USA), “Future of Membrane Separations through Atomic Layer Processing”
• Hao Van Bui (Phenikaa University, Vietnam), “TBD”
• Anna Chernikova (MIPT ALD Group, Russia), “Atomic Layer Deposition of Functional Dielectrics and Metals for the Emerging Non-Volatile Memories”
• Fatemeh SM Hashemi (TU Delft, Netherlands), “Atomic-Level Precision at Large Scale: Opportunities and Challenges of ALD”
• Maarit Karppinen (Aalto University, Finland), “New Metal-Organic Materials Through ALD/MLD for Emerging Energy Technologies”
• Asif Khan (Georgia Institute of Technology, USA), “Ferroelectric Devices: From Applications to Microstructures”
• Hanboram Lee (Incheon National University, South Korea), “Another Opportunity in Area Selective Atomic Layer Deposition Using Precursor Inhibitors”
• Catherine Marichy (Université Claude Bernard Lyon 1, France), “ALD of Boron Nitride by Polymer Derived Ceramics Chemistry”
• Michael Nolan (Tyndall National Institute, Ireland), “TBD”
• Tania Sandoval (Universidad Técnica Federico Santa María, Chile), “The Role of Precursor-Inhibitor Interactions on Area-Selective ALD”
• Nathanaelle Schneider (CNRS Photovoltaics Unit, France), “ALD-Oxide Materials and Surface Modification for Next-Generation PV Devices”
• Henrik Soensteby (University of Oslo, Norway), “When Complex Becomes Complicated – Strategies for Succeeding with Arduous Ternary Oxide Processes”
• Myung-Mo Sung (Hanyang University, South Korea), “Atomic Layer Deposition of Amorphous/Nanocrystalline Phase-Composite Nanolayers”
• Jinjuan Xiang (Institute of Microelectronics, Chinese Academy of Sciences, China), “ALD Growth of Low Workfunction Metal Gate for FinFET Technology”

ALE Invited Speakers

• Erwin Kessels (Eindhoven University of Technology, The Netherlands), “Plasma ALE for Anisotropic and Isotropic Etching”
• Ann Lii-Rosales (University of Colorado, Boulder, USA), “Exploration of the Thermal Landscape of Atomic Layer Etching by Mass Spectrometry”
• Tetsuya Nishizuka (TEL Miyagi, Japan), “Atomic Scale Profile Control in Fine Pitch Patterning and High Aspect Ratio Contact Hole Etching”
• Samantha Tan (Lam Research, USA), “Patterning High Density STT-MRAM with a Novel Atomic Layer Etch Process”
• Geun Young Yeom (Sungkyunkwan University, South Korea), “Precise Atomic Layer Control of 2D MoS₂ by ALE Technique for Device Applications”