ald2021

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Virtual Meeting Overview & Highlights

The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The registration deadline is June 30, 2021; all presenters must register by May 10, 2021. The event will feature:

Live Tutorial Session with live Q&A Chat Opportunities (Sunday, June 27, 2021)
Live Plenary, Awards, and Student Finalists with live Q&A Chat Opportunities (Monday, June 28, 2021)
Live Parallel Technical Sessions with live Q&A Chat Opportunities (Tuesday-Wednesday, June 29-30, 2021)
On Demand Oral Sessions (Starting Monday, June 28, 2021)
On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files

Note: Live and On Demand Sessions available on Mobile App/Online Scheduler through July 31, 2021 and then to AVS members in the AVS Technical Library. Live Sessions will also be recorded and added to the On Demand Sessions.

Time Zone: Eastern Daylight Time (EDT)

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Virtual Meeting Quick Links

Technical Program & Scheduler

Conference Overview & Live Session Schedule

Live ALD & ALE Tutorial Session

Sunday, June 27, 2021

Moderators: Prof. Seán Barry, Carleton University, Canada, Dr. Scott Clendenning, Intel Corporation, USA

10:00 a.m. EDT	Tutorial Opening Remarks & Welcome, *Seán Barry*, Carleton University, Canada
10:05 a.m.	ALE and ALD: Two Biotopes of a Kind in Atomic-Scale Processing, Fred Roozeboom, Eindhoven University of Technology, The Netherlands
10:50 a.m.	BREAK
10:55 a.m.	Fundamentals of Atomic Layer Deposition: An Introduction (“ALD 101”), Riikka Puurunen, Aalto University, Finland
11:40 a.m.	BREAK
11:45 a.m.	Let’s Talk Dirty – Battling Impurities in ALD Films, Henrik Pedersen Linköping University, Sweden
12:30 p.m.	BREAK
12:35 p.m.	Seeing Is Believing: In situ Techniques for Atomic Layer Deposition (ALD) Process Development and Diagnostics, Parag Banerjee, University of Central Florida, USA
1:20 p.m.	BREAK
1:25 p.m.	ALD Powder Manufacturing, Arrelaine Dameron, Forge Nano, USA
2:10 p.m.	Closing Remarks & Thank You!, Scott Clendenning, Intel, USA

Live ALD & ALE Technical Sessions

Monday-Wednesday, June 28-30, 2021

Plenary Speakers: Monday, June 28, 2021

Plenary Speaker: Mechanisms of Thermal Atomic Layer Etching, Steven George, University of Colorado Boulder, USA
Plenary Speaker: Materials & Innovation – Essential Elements that Underpin the Next Industrial Revolution, Todd Younkin, Semiconductor Research Corporation, USA

ALD Student Award Finalist Talks: Monday, June 28, 2021

ALD Student Award Finalist Talk: What Controls the Conformality of Plasma ALD in High-Aspect-Ratio Applications?, Karsten Arts, Sanne Deijkers, Tahsin Faraz, Eindhoven University of Technology; Riikka L. Puurunen, Aalto University; Erwin Kessels, Harm Knoops, Eindhoven University of Technology
ALD Student Award Finalist Talk: Electron-Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using (DMBD)Ru(CO)3, Michael Collings, Steven George, University of Colorado, Boulder
ALD Student Award Finalist Talk: Enhanced Surface Adsorption in Electric Field/Potential Assisted Atomic Layer Deposition (EA-ALD) of Ultrathin Ru Film, Yoon Jeong Kim, Ji Won Han, Ji Sun Heo, Tae Joo Park, Hanyang University, Korea
ALD Student Award Finalist Talk: Tuning Properties of Vapor Deposited ZIF-8 Thin Films With Preferred Orientation, Marianne Kräuter, Graz University of Technology
ALD Student Award Finalist Talk: Surface Passivation Using Aminosilanes for Area-Selective Atomic Layer Deposition, Kaat Van Dongen, KU Leuven; Rachel Nye, North Carolina State University; Danilo De Simone, Annelies Delabie, IMEC, Belgium
ALD Student Award Finalist Talk: Insight into Film Growth Mechanisms in Polyurea Molecular Layer Deposition (MLD) Using New and Combined Precursors, Siyao Wang, Rachel Nye, Gregory Parsons, North Carolina State University

ALE Student Award Finalist Talks: Monday, June 28, 2021

ALE Student Award Finalist Talk: Modelling Atomic Layer Etching of Thin Film Metal Oxides, Rita Mullins, Tyndall National Institute, University College Cork; Suresh Kondati Natarajan, Synopsys; Michael Nolan, Tyndall National Institute, University College Cork
ALE Student Award Finalist Talk: Thermal Atomic Layer Etching of Cobalt Using SO2Cl2 and P(CH3)3, Jessica Murdzek, Steven George, University of Colorado Boulder
ALE Student Award Finalist Talk: Cryo-ALE of Silicon Based Materials, Jack Nos, Gaëlle Antoun, Thomas Tillocher, Philippe Lefaucheux, GREMI CNRS/Université d’Orléans; Jacques Faguet, Tokyo Electron America Inc.,; Kaoru Maekawa, TEL Technology Center America; Rémi Dussart, GREMI CNRS/Université d’Orléans
ALE Student Award Finalist Talk: Reaction Pathways Leading to Anisotropic Pattering of Cu, Xia (Gary) Sang, Mark Martirez, Taylor Smith, Emily Carter, Jane Chang, University of California at Los Angeles